Nanometer-level measurement technology includes: nanometer-level precision size and displacement measurement, and nanometer-level surface topography measurement. There are two main development directions for nanometer measurement technology.
One is the optical interferometry technology, which uses the interference fringes of light to improve the resolution of the measurement. The measurement methods include: dual-frequency laser interferometry, optical heterodyne interferometry, X-ray interferometry, F-P standard Tool measurement method, etc., can be used for precise measurement of length and displacement, and can also be used for measurement of surface micro-topography.
The second is scanning probe microscopic measurement technology (STM). Its basic principle is based on the tunneling effect of quantum mechanics. Its principle is to use a very sharp probe (or similar method) to scan the measured surface (probe and The measured surface is not actually in contact), and the three-dimensional microscopic appearance of the surface is measured with the help of a nano-level three-dimensional displacement positioning control system. Mainly used to measure the microscopic appearance and size of the surface.
Measurement methods using this principle include: scanning tunneling microscope (STM), atomic force microscope (AFM), and so on.